R&D Field

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Top Class Grower manufacturer in Korea PV & Semiconductor

R&D

As the global No. 1 Semiconductor equipment manufacturer,
S-TECH has a pride and a bigger dream.


R&D


R&D Field.S-TECH provides Total Solution through its World-Class Technology and service.

R&D Field

R&D field

S-TECH provides lifetime value through its world’s best Technology and Solution.

  • Semiconductor Equipment

     

  • Photovoltaic Equipment

     

  • Equipment & Material Parts

     

Semiconductor Equipment

High-precision single-crystal silicon grower for high-quality Semiconductor wafers

Development and research of the high-quality single-crystal silicon Ingot Grower for Semiconductors: The grower which grows high-quality single-crystal silicon ingots for Semiconductors, is researched and developed. We strive to obtain the technologies to grow ingots with high quality, such as structural improvement in the internal hot-zone and minimization of foreign matters and micro defects. Our research is aimed at improving customer satisfaction through high-precision control system, high reliability, and the development of optimized process automation system.

Grower for manufacturing Si parts with over 450mm in large diameter

Development and research of the single-crystal silicon large-diameter Ingot Grower for manufacturing Semiconductor parts: The grower which grows single-crystal silicon ingots for Semiconductor wafers and Si jig & fixture with over 32-inch is researched and developed. We strive to obtain the technologies to grow large-diameter ingots with high quality and do the best to make structural improvements in large-diameter parts for a higher ingot yield through high productivity and stabilization. Our research is aimed at improving customer satisfaction through high-precision control system, high reliability, and the development of optimized process automation system.

PVT for 4, 6, & 8-inch SiC single-crystal growth

Development of the crystal grower for next-generation compounds Semiconductor: The crystal grower for the next-generation compounds Semiconductor Wide Band Gap(WBG) is developed to secure a global value chain. We strive to develop the large-area (8-inch) based SiC single-crystal grower, localize mechanical system and operation system (PVT, RF heater, electric & electronic control algorithm), secure highly-reliable operation system, and make the system configuration for the SiC single-crystal growth shape monitoring out of crystal growth processes. Our research is aimed at receiving high customer reliability and improving customer satisfaction.

Photovoltaic Equipment

Highly productive Si single-crystal grower with 1 ton charge capacity for PV market

Single crystal Silicon Wafer for Solar cell
Development and research of the single-crystal silicon large-scale Ingot Grower for Photovoltaics.
The grower which grows single-crystal silicon ingots with over 40-inch in diameter for solar cells is researched and developed. We strive to achieve structural improvement for higher productivity, develop high-precision control system optimized process automation system, and obtain high reliability. Our research is fully focused on improving the customer’s satisfaction.

Automatic backsheet removal system for recycling Photovoltaic modules

The Photovoltaic backsheet removal system is used to removal Photovoltaic backsheets as a waste module and collects the removed back sheets. To make the system control precise and automatic, S-TECH continues to enhance the system to be customer friendly product. This system is composed of loading/unloading unit, backsheet separation conveyor, automatic control unit for backsheet separation, and eco-friendly capture unit for removal backsheets. We conduct research to develop a highly reliable system to improve customer satisfaction.

CVD for Direct Wafer

R&D of Direct Single-crystal Silicon Wafer for Solar Cells
Development of plasma process based epitaxy Equipment and process Technology.
The CVD based single-crystal silicon wafer deposition Technology for Photovoltaics with the use of epitaxial growth at low temperature is researched and developed.
Our research is aimed at making the optimal design of plasma epitaxy process reactor, making the continuous processes of layer separation-delamination-epitaxial growth, researching nano-gap formation mechanism through porosity rate control, achieving high-speed epitaxial growth with high quality, and improving bulk quality.

Materials & Parts Equipment

  • Next-generation secondary batteriesSiOx negative electrode manufacturing system (plasma torch type)
  • Power SemiconductorHigh purity SiC powder manufacturing
  • Next-generation Power SemiconductorDevelopment of AlN, Ga2O3 ingot growing technology

그누보드5
  • Company Name : S-TECH Co., Ltd.
  • Address : 33, Secheon-ro- 3-gil, Dasa-eup, Dalseong-gun, Daegu 42921, South Korea
  • CEO : Jin-Sub, Park
  • Company Registration Number : 504-81-82347
  • TEL : +82-70-4343-3400
  • FAX : +82-53-354-5114
  • Email : sales@stech.co.kr
  • Hosting : Daosweb

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