R&D Direction
R&D direction
Research on Semiconductor Equipment
01
Technology to improveProductivity & Quality
- Up-time yield & Throughput maximization
- In-line Process Monitoring system
- High-precision control system
- Improved Process Yield
02
Pull Automation
Pull Automation
& Safety Environment
- Unmanned operation system
- Process monitoring & remote control system
- Standardization system for predictive maintenance and safety specification
- AGV system interoperable with Equipment
R&D direction
Research on next-generation business areas
Research on highly-pure SiC powder manufacturing Technology
- Carbothermal reduction based highly-pure SiC powder manufacturing (Acquisition of LG Innotek, 2021)
- Development of low-cost & high-quality "SiO2 + C source" fabrication Technology
- Research on associated quality of SiC Powder vs. SiC crystals through SiC single-crystal grower
- Development of mass-production typed Turn-key line (mixing-fabrication-grain growth-classification)
Product Specification
Typical Chemical Analysis
| Element | Unit | Spec. | Real Value |
|---|---|---|---|
| AI | ppm | ＜1 | 0.36 |
| B | ＜1 | 0.66 | |
| Ca | ＜1 | 0.53 | |
| Co | ＜0.2 | ＜0.01 | |
| Cr | ＜0.2 | 0.15 | |
| Fe | ＜0.2 | ＜0.05 | |
| Mg | ＜0.2 | ＜0.05 | |
| Na | ＜0.2 | 0.05 | |
| Ni | ＜0.2 | ＜0.01 | |
| Ti | ＜1 | 0.88 | |
| W | ＜0.2 | ＜0.05 | |
| V | ＜0.5 | 0.37 |
Other Properties
| Characteristics | Unit | Spec. | Real Value |
|---|---|---|---|
| Particle size(D) | ㎛ | 230±30 | 232 |
| Span(D / D) | - | ＜4 | 2.6 |
| Tot. Nitrogen | ppm | ＞200 | 16 |
| Tot. Oxygen | ppm | ＞200 | 200 |
| Apparent Density | g/cm3 | ＞1.7 | 1.77 |
| Tapping Density | g/cm3 | ＞1.9 | 1.98 |
